POSITIVE PHOTORESISTS
A photoresist is a light-sensitive material used in several processes, such as photolithography and photoengraving, to form a patterned coating on a surface, which is crucial in the whole electronic industry. Resists may be classified either as positive or negative, depending on response to exposure.
When exposed to the UV light, the positive resist becomes more soluble in the developer. The exposed resist is then washed away by the developer solution, leaving windows of the bare underlying material. The mask, therefore, contains an exact copy of the pattern which is to remain on the wafer, as a stencil for subsequent processing.
Positive tone photoresists designed for the use in microelectronics and microsystems technology. Applications include etching, electroplating, and ion implantation.
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ma-P 1200
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ma-P 1275 & ma-P 1275HV
Positive tone photoresists specifically designed for the requirements of greyscale lithography. Applications include UV moulding or etching, and electroplating.
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ma-P 1275G
Positive tone photoresists specifically designed for the requirements of e-beam and DUV lithography. Applications include etch masking.
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mr-PosEBR
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PMMA
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UV5
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UV6
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UV26
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UV60
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UV210 GS
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UV1100
A range of process chemicals such as thinners, primers, developers and removers for positive photoresists.
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Ancillaries
for Positive Resists