NANOIMPRINT RESISTS

RotaLab provides resist formulations for nanoimprint lithography (NIL). The unique key features of our products are outstanding film forming and imprinting performance beside excellent pattern fidelity and plasma etch stability. Our nanoimprint resists are mostly applied as etch mask for pattern transfer into various substrates, like Si, SiO2, Al or sapphire.

Basically, two different variants of NIL have been developed so far: thermal NIL (also known as "thermoplastic NIL", T-NIL), in which a thermoplastic polymer is used, and photo NIL (also known as "photocurable NIL", P-NIL), in which a liquid photo-curable formulation is applied.